2009, Vol. 26(1): 18102-018102 DOI: 10.1088/0256-307X/26/1/018102 | ||
Low-Temperature (<100°C) Poly-Si Thin Film Fabrication on Glass | ||
WANG Cheng-Long1,2, FAN Duo-Wang1,2, SUN Shuo3, ZHANG Fu-Jia3, LIU Hong-Zhong4 | ||
1National Engineering Research Center for Technology and Equipment of Green Coating, Lanzhou Jiaotong University, Lanzhou 7300702MOE Key Lab of Opto-electronic Technology and Intelligence Control, Lanzhou Jiaotong University, Lanzhou 7300703School of Physics Science and Technology, Lanzhou University, Lanzhou 7300004State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049 | ||
收稿日期 2008-04-12 修回日期 1900-01-01 | ||
Supporting info | ||
[1] Atsutoshi Doi 2004 Thin Solid Films 451/452 [2] Lin X Y, Huang C J and Lin K X 2003 Chin. Phys. [3] Huang R, Lin X Y and YU Y P 2004 Chin. Phys. Lett. [4] Evelyn Schmich, Norbert Schillinger and Stefan Reber 2007 [5] Falk F and Andra G 2006 J. Cryst. Growth 287 [6] Song DY, Inns D and Straub A 2006 Thin Solid [7] Pereira L, Aguas H and Martins R M S 2004 Thin [8] Gall S, Muske M and Sieber I 2002 J. Non-Cryst. [9] Nast O and Wehnman S R 2000 J. Appl. Phys. 88 [10] Gangopadhyay U, Dhungel S K and Basu P K 2007 Sol. [11] Ornaghi C, Beaucarne G and Poortmans J 2004 Thin [12] Pihan E, Slaoui A, Rocai Cabarrocas P and Focsa A 2004 [13] Gupta S, Hitesh C and Alka K 2008 Thin [14] Wang R C, Du P Y and Shen G 2002 Thin [15] Ekanayake G and Reehal H S 2006 Vacuum 81 272 [16] Swati Ray, Sumita Mukhopadhyay and Saha S C 1999 [17] Liu L, Luo Y L and Huang R 2007 J. [18] Wang C L, Fan D W, Sun S and Zhang F J 2008 J. Semiconductors 29 1544 [19] Chen Y K, Lin K X and Luo Z 2004 Acta Phys. Sin. |
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