2009, Vol. 26(4): 42501-042501 DOI: 10.1088/0256-307X/26/4/042501 | ||
Ion Beam Analysis of the Annealing Behavior of Helium in Ti Films | ||
HE Zhi-Jiang, SHI Li-Qun, LIU Chao-Zhuo, ZHANG Lei, LU Yong-Fang, ZHANG Bin |
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Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433 | ||
收稿日期 2008-10-28 修回日期 1900-01-01 | ||
Supporting info | ||
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