[1] Lieberman M A and Lichtenberg A J 1994 Principles of
Plasma Discharges and Materials Processing (New York: Wiley)

[2] Haas R A 1973 Phys. Rev. A 8 1017

[3] Ishikawa I, Matsumoto M and Suganomata S 1984 J.
Phys. D 17 85

[4] Barkalov A D and Gladush G G 1979 Sov. Phys. Tech.
Phys. 24 1203

[5] Katsch H M, Goehlich A, Kawetski T, Quandt E and Dobele H
F 1999 Appl. Phys. Lett. 75 2023

[6] Descoeudres A, Sansonnens L and Hollenstein Ch 2003
Plasma Sources Sci. Technol. 12 152

[7] Tuszewski M 1996 J. Appl. Phys. 79 8967

[8] Lieberman M A, Lichtenberg A J and Marakhtanov A M 1999
Appl. Phys. Lett. 75 3617

[9] Chabert P, Lieberman M A, Lichtenberg A J and Marakhtanov
A M 2001 Plasma Sources Sci. Technol. 10 478

[10] Singh H and Graves D B 2000 J. Appl. Phys. 88
3889

[11] Abada H, Chabert P, Booth J P, Robiche J and Cartry G
2002 J. Appl. Phys. 92 4223

[12] Marakhtanov A M, Tuszewski M, Liebermana M A, Lichtenberg
A J and Chabert P 2003 J. Vac. Sci. Technol. A 21 1849

[13] Tuszewski M, White R R and Wurden G A 2003 Plasma
Sources Sci. Technol. 12 396

[14] Tuszewski M and Gary S P 2003 Phys. Plasmas
10 539

[15] Kim T W and Aydil E S 2003 Plasma Sources Sci.
Technol. 12 148

[16] Corr C S, Steen P G and Graham W G 2003 Plasma
Sources Sci. Technol. 12 265

[17] Tuszewski M and White R R 2004 J. Appl. Phys.
94 2858

[18] Corr C, Steen P and Graham W 2005 Appl. Phys. Lett.
86 141503

[19] Goodman1D L and Benjamin N M P 2003 J. Phys. D:
Appl. Phys. 36 2845

[20] Sober'on F, Marro F G, Graham W G, Ellingboe A R and Law
V J 2006 Plasma Sources Sci. Technol. 15 193

[21] Plihon N. Corr C S, Chabert P and Raimbault J L 2005
J. Appl. Phys. 98 023306

[22] Ding Z F, Yuan G Y, Gao W and Sun J C 2008 Phys.
Plasmas 15 063506

[23] Miller P A, Hebner G A,. Greenberg K E, Pochan P D and
Aragon B P 1995 J. Res. Natl. Inst. Stand. Technol. 100
427