[1] Lieberman M A and Lichtenberg A J 2005 Principles of
Plasma Discharges and Materials Processing 2nd edn (New York:
Wiley)

[2]Goto H H, Lowe H-D and Ohmi T 1993 IEEE Trans.
Semicond. Manuf. 6 58

[3]Goto H H, Lowe H-D and Ohmi T 1992 J. Vac. Sci.
Technol. A 10 3048

[4]Boyle P C, Robiche J and Turner M M 2004 J. Phys. D:
Appl. Phys. 37 1451

[5]Chen F F 1990 Plasma Physics and Controlled Fusion
(New York: Plenum)

[6]Dai Z L, Xu X and Wang Y N 2007 Phys. Plasma 14
013507

[7]Wang L H, Dai Z L and Wang Y N 2006 Chin. Phys. Lett.
23 668

[8]Dai Z L, Liu C S and Wang Y N 2008 Chin. Phys. Lett.
25 632

[9]Jiang W, Mao M and Wang Y N 2006 Phys. Plasma
13 113502

[10]Kim D and Economou D J 2002 IEEE Trans. Plasma Sci.
30 2048

[11]Kim D and Economou D J 2003 J. Appl. Phys. 94
2852

[12]Hou L J and Wang Y N 2004 Phys. Plasma 11 4456

[13]Hamaoka F et al 2007 IEEE Trans. Plasma Sci.
35 1350

[14]Dai Z L et al 2009 Plasma Sci. and Technol. 11
283

[15]Liberman M A 2000 IEEE Trans. Plasma Sci. 16
638

[16]Liberman M A 1989 IEEE Trans. Plasma Sci. 17
338

[17]Edelberg E A and Aydil E S 1999 J. Appl. Phys.
86 4799

[18]Hou L J et al 2004 Plasma Sci. and Technol. 6
2404

[19]Boris J P, Landsberg A M, Oran E S and Gardner J H 1993
Naval Research Laboratory Memorandum Report No 6410-93-7192

[20]Zalesak S T 1979 J. Comput. Phys. 31 335

[21]Boris J P and Book D L 1973 J. Comput. Phys.
11 38

[22]Kim H C and Manousiouthakis V I 1998 J. Vac. Sci.
Technol. A 16 2162

[23]Ahn T H et al 1996 Plasma Sources Sci. Technol.
5 139

[24]Guan Z Q, Dai Z L, and Wang Y N 2005 Phys. Plasma
12 123502