2010, Vol. 27(3): 38103-038103    DOI: 10.1088/0256-307X/27/3/038103
Effects of AlGaN/AlN Stacked Interlayers on GaN Growth on Si (111)
WANG Hui1, LIANG Hu2, WANG Yong2, NG Kar-Wei2, DENG Dong-Mei2, LAU Kei-May2
1State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083 2Photonics Technology Center, Electronic and Computer Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
收稿日期 2009-12-11  修回日期 1900-01-01
Supporting info
[1] Dadgar A, Bl\"{asing J, Diez A, Alam A, Heuken M and Krost A 2000 Jpn. J. Appl. Phys. 39 L1183
[2] Dadgar A, Poschenrieder M, Bl\"{asing J, Fehse K, Diez A and Krost A 2002 Appl. Phys. Lett. 80 3670
[3] Feltin E, Beaumont B, La\"{Augt M, Mierry P de, Venn\'{egu\`{es P, Lahr$\muup$eche H, Leroux M and Gibart P 2001 Appl. Phys. Lett. 79 3230
[4] Marchand H, Zhao L, Zhang N, Moran B, Coffie R, Mishra U K, Speck J S, Denbaars S P and Freitas J A 2001 J. Appl. Phys. 89 7846
[5] Able A, Wegscheider W, Engl K and Zweek J 2005 J. Cryst. Growth 276 415
[6] Cheng K, Leys M, Degroote S, Daele B V, Boeykens S, Derluyn J, Germain M, Tendeloo G V, Engelen J and Borghs G 2006 J. Electron. Mater. 35 592
[7] Kim M, Do Y, Kang H C, Noh D Y and Park S J 2001 Appl. Phys. Lett. 79 2713
[8] Lin G Q, Zeng Y P, Wang X L and Liu H X 2008 Chin. Phys. Lett. 25 4097
[9] Bl\"{asing J, Reiher A, Dadgar A, Diez A, and Krost A, 2002 Appl. Phys. Lett. 81 2722
[10] Dadgar A, Poschenrieder M, Reiher A, Bl\"{asing J, Christen J, Krtschil A, Finger T, Hempel T, Diez A and Krost A 2003 Appl. Phys. Lett. 82 28
[11] Zhang B S, Liang H, Wang Y, Feng Z H, Ng K W and Lau K M 2007 J. Cryst. Growth 298 725
[12] Perlin P, Carrillon C J, Itie J P, Miguel A S, Grzegory I and Polian A 1992 Phys. Rev. B 45 83
[13] Tripathy S, Chua S J, Chen P and Miao Z L 2002 J. Appl. Phys. 92 3503
[14] Wang L S, Tripathy S, Wang B Z, Teng J H, Chow S Y and Chua S J 2006 Appl. Phys. Lett. 89 011901
[15] Follstaedt D M, Lee S R, Provencio P P, Allerman A A, Floro J A and Crawford M H, 2005 Appl. Phys. Lett. 87 121112
[16] Wang J F, Yao D Z, Chen J, Zhu J J, Zhao D G, Jiang D S, Yang H and Liang J W 2006 Appl. Phys. Lett. 89 152105