2010, Vol. 27(5): 50601-050601    DOI: 10.1088/0256-307X/27/5/050601
	Determination of Mean Thickness of an Oxide Layer on a Silicon Sphere by Spectroscopic Ellipsometry
	ZHANG Ji-Tao1, LI Yan1, LUO Zhi-Yong2, WU Xue-Jian1
	1State Key Lab of Precision Measurement Technology and Instruments, Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084 2National Institute of Metrology, Beijing 100013
	收稿日期 2009-10-27  修回日期 1900-01-01
	Supporting info
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