2007, Vol. 24(4): 994-997 DOI: | ||
Super-Resolution Recording by an Organic Photochromic Mask Layer | ||
SHI Ming 1, ZHAO Sheng-Min 2, YI Jia-Xiang 1, ZHAO Fu-Qun 1, NIU Li-Hong 1, LI Zhong-Yu 1, ZHANG Fu-Shi 1 | ||
1Key Lab of Organic Optoelectronics & Molecular Engineering of Ministry of Education, Department of Chemistry, Tsinghua University, Beijing 1000842Lab of Printing & Packaging Material and Technology-Beijing Area Major Laboratory, Beijing Institute of Graphic Communication, Beijing 102600 | ||
收稿日期 2006-09-15 修回日期 1900-01-01 | ||
Supporting info | ||
[1] Gan F X, Hou L, Wang G, Liu H and Li J 2000 Mater. Sci. [2] Fukumoto A and Kubota S 1992 Jpn. J. Appl. Phys. [3] Liu R, Xu D Y and Qi G S 2002 Proc. SPIE 4930 285 [4] Betzig E, Trautman J K, Wolfe R and Gyorgy E M 1986 Appl. [5] Lu Y H, Xie J P, Zhang J Y, Hai M and Wang P 2002 Opt. [6] Tominaga J, Nakano T and Atoda N 1998 Appl. Phys. Lett. [7] Tsai D P, Yang C W, Lin W C, Ho F H, Chen M Y, Tseng T F, Lee C H [8] Kasami Y, Yasuda K, Ono M, Fukumoto A and Kaneko M 1996 [9] Shintani T, Terao M, Yamamoto H and Naito T 1999 Jpn. J. [10] Zhang F, Xu W D, Wang Y and Gan F X 2006 Solid State [11] Lu Y H, Dimitrov D, Liu J R, Hsieh T E and Da H P 2001 Jpn. [12] Shi L P, Chong T C, Miao X S, Tan PK and Li J M 2001 Jpn. J. [13] Zhang F, Wang Y, Xu W D and Gan F X 2005 Opt. Engin. [14] Zhang F, Wang Y, Xu W D,Shi H R, Wei J S and Gan F X 2004 [15] Cheng C F, Ren X R, Liu C X, Zhang N Y, Teng S Y and Xu Z Z 2004 [16] Zhu R J, Wang J, Ou D R, Zhu J and Jin G F 2005 Chin. Phys. [17] Kurihara K and Yamakawa Y 2006 Nanotechnology 17 [18] Tsujioka T, Kume M and Irie M 1997 Opt. Rev. 4 385 [19] Tsujioka T, Harada T, Kume M and Irie M 1997 Jpn. J. Appl. [20] Chen W Z, Wu Y Q, Wang Y and Gan F X 2006 Chin. Phys. [21] Tsujioka T, Harada T, Kume M, Kuroki K and Irie M 1995 Opt. [22] Irie M 2000 Chem. Rev. 100 1685 [23] Zhou G Q, Chen L and Ni Y Z 2006 Chin. Phys. Lett. 23 [24] Sun F, Zhang F S, Guo H B, Zhou X H, Wang R J and Zhao F Q 2003 [25]Wei M K and Yang H 2003 Int. J. Adv. Manuf. Tech. 21 |
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