2007, Vol. 24(8): 2419-2422    DOI:
GaN MOS-HEMT Using Ultra-Thin Al2O3 Dielectric Grown by Atomic Layer Deposition
YUE Yuan-Zheng, HAO Yue, FENG Qian, ZHANG Jin-Cheng, MA Xiao-Hua, NI Jin-Yu
Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071
收稿日期 2007-03-20  修回日期 1900-01-01
Supporting info

[1] Ye P D, Yang B, Ng K K, Bude J, Wilk G D, Halder S and Hwang J C M
2005 Appl. Phys. Lett. 86 063501

[2] Maeda N, Saitoh T, Tsubaki K, Nishida T and Kobayashi N 1999
Jpn. J. Appl. Phys. 38 987

[3] Khan M A, Shur M S, Chen Q C and Kuznia J N 1994
Electron. Lett. 30 2175

[4] Binari S C, Rowland L B, Kelner G, Kruppa W, Dietrich H B,
Doverspike K and Gaskill D K 1995 International Symposium Compound
Semiconductors () p 459

[5] Ren F, Hong M, Chu S N G, Marcus M A, Schurman M J, Baca A, Pearton
S J and Abernathy C R 1998 Appl. Phys. Lett. 73 3893

[6] Khan M A, Hu X, Sumin G, Lunev A, Yang J, Gaska R and Shur M S 2000
IEEE Electron. Device Lett. 21 63

[7] Khan M A, Hu X, Tarakji A, Simin G, Yang J, Gaska R and Shur M S
2000 Appl. Phys. Lett. 77 1339

[8] Simon G, Hu X, Ilinskaya N, Kumar A, Koudymov A, Zhang J, Khan M A,
Gaska R and Shur M S 2000 Electron. Lett. 36 2043

[9] Koudymov A, Hu X, Simin K, Simin G, M Ali, Yang J and Khan M A 2002
IEEE Electron. Device Lett. 23 449

[10] Simin G, Koudymov A, Fatima H, Zhang J, Yang J, Khan M A, Hu X,
Tarakji A, Gaska R and Shur M S 2002 IEEE Electron. Device Lett.
23 458

[11] Simon G, X Hu, Ilinskaya N, Zhang J, Tarakji A, Kumar A, Yang J,
Khan M A, Gaska R and Shur M S 2001 IEEE Electron. Device Lett.
22 53

[12] Hu X, Koudymov A, G Simon, Yang J, Khan M A, Tarakji A, Shur M S
and Gaska R 2001 Appl. Phys. Lett. 79 2832

[13] Hashizume T, Ootomo S and Hasegawa H 2003 Appl. Phys. Lett.
83 2952

[14] Mehandru R, Luo B, Kim J, Ren F, Gila B P, Onstine A H, Abernathy
C R, Pearton S J, Gotthold D, Birkhahn R, Peres B, Fitch R, Gillespie
J, Jenkins T, Sewell J, Via D and Crespo A 2003 Appl. Phys. Lett.
82 2530

[15] Hao Z B, Guo T Y, Zhang L C and Luo Y 2006 Chin. Phys. Lett.
23 497