| 2008, Vol. 25(1): 209-211 DOI: | ||
| Si Underlayer Induced Nano-Ablation in AgInSbTe Thin Films | ||
| JIAO Xin-Bing, WEI Jing-Song, GAN Fu-Xi | ||
| Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 | ||
| 收稿日期 2007-09-10 修回日期 1900-01-01 | ||
| Supporting info | ||
[1]Lee B and Abelson J R 2005 J. Appl. Phys. 97 093509 [2] Sun Z, Zhou J and Ahuja R 2007 Phys. Rev. Lett. [3] Njoroge W K and Wuttig M 2001 J. Appl. Phys. 90 3861 [4] Kalb J, Spaepen F and Wuttig M 2003 J. Appl. Phys. 93 2839 [5] Avrutsky I, Gerogiev D G, Frankstein D et al 2004 Appl. Phys. [6] Ju Y S and Goodson K E 1999 Appl. Phys. Lett. 74 3005 [7] Edwards A L 1969 A Compilation of Thermal Property |
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