Enhanced Surface-Plasmon-Polariton Interference for Nanolithography by a Micro-Cylinder-Lens Array Support info


	2010, Vol. 27(9): 94205-094205 DOI: 10.1088/0256-307X/27/9/094205

	Enhanced Surface-Plasmon-Polariton Interference for Nanolithography by a Micro-Cylinder-Lens Array
	LIANG Hui-Min¹, WANG Jing-Quan², FAN Feng¹, QIN Ai-Li¹, ZHANG Chun-Yuan¹, CHENG Hui¹
	¹College of Science, Hebei University of Engineering, Handan 056038 ²College of Physical Science and Technology, Sichuan University, Chengdu 610064
	收稿日期 2010-04-19 修回日期 1900-01-01
	Supporting info


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