Influence of Small-Size Contaminations on Thin Film Structural Properties
F. V. Grigoriev1**, V. B. Sulimov1, Jinlong Zhang2,3,4, Xinbin Cheng2,3,4, Zhanshan Wang2,3,4, A. V. Tikhonravov1
1Research Computing Center, M.V. Lomonosov Moscow State University, Moscow 119991, Russia 2MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai 200092 3Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092 4IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240
Abstract：An approach for studying the influence of nano-particles on the structural properties of deposited thin films is proposed. It is based on the molecular dynamic modeling of the deposition process in the presence of contaminating nano-particles. The nano-particle is assumed to be immobile and its interaction with film atoms is described by a spherically symmetric potential. The approach is applied to the investigation of properties of silicon dioxide films. Visualization tools are used to investigate the porosity associated with nano-particles. The structure of the film near the nano-particle is studied using the radial distribution function. It is found that fluctuations of film density near the nano-particles are essentially different in the cases of low-energy and high-energy deposition processes.
. [J]. 中国物理快报, 2019, 36(3): 38101-.
F. V. Grigoriev, V. B. Sulimov, Jinlong Zhang, Xinbin Cheng, Zhanshan Wang, A. V. Tikhonravov. Influence of Small-Size Contaminations on Thin Film Structural Properties. Chin. Phys. Lett., 2019, 36(3): 38101-.
2019, Vol. 36 
