Influence of Small-Size Contaminations on Thin Film Structural Properties
F. V. Grigoriev1**, V. B. Sulimov1, Jinlong Zhang2,3,4, Xinbin Cheng2,3,4, Zhanshan Wang2,3,4, A. V. Tikhonravov1
1Research Computing Center, M.V. Lomonosov Moscow State University, Moscow 119991, Russia 2MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai 200092 3Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092 4IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240
Abstract:An approach for studying the influence of nano-particles on the structural properties of deposited thin films is proposed. It is based on the molecular dynamic modeling of the deposition process in the presence of contaminating nano-particles. The nano-particle is assumed to be immobile and its interaction with film atoms is described by a spherically symmetric potential. The approach is applied to the investigation of properties of silicon dioxide films. Visualization tools are used to investigate the porosity associated with nano-particles. The structure of the film near the nano-particle is studied using the radial distribution function. It is found that fluctuations of film density near the nano-particles are essentially different in the cases of low-energy and high-energy deposition processes.
. [J]. 中国物理快报, 2019, 36(3): 38101-.
F. V. Grigoriev, V. B. Sulimov, Jinlong Zhang, Xinbin Cheng, Zhanshan Wang, A. V. Tikhonravov. Influence of Small-Size Contaminations on Thin Film Structural Properties. Chin. Phys. Lett., 2019, 36(3): 38101-.