Structural Variation and Its Influence on the $1/f$ Noise of a-Si$_{1-x}$Ru$_{x}$ Thin Films Embedded with Nanocrystals
Chong Wang1 , Hao Zhong1 , Eddy Simoen2 , Xiang-Dong Jiang3 , Ya-Dong Jiang1 , Wei Li1**
1 State Key Lab of Electronic Thin Films & Integrated Devices, University of Electronic Science and Technology of China, Chengdu 6100542 IMEC, Kapeldreef 75, Leuven B-3001, Belgium3 School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054
Abstract :The structural variation and its influence on the $1/f$ noise of a-Si$_{1-x}$Ru$_{x}$ thin films are investigated by Raman spectroscopy, transmission electron microscopy, and low frequency noise measurement. The Ru atoms are introduced into the amorphous silicon thin films by rf magnetron co-sputtering. Ru$_{2}$Si nanocrystals are found in the as-deposited samples. It is shown that the $1/f$ noise of the films can be reduced by a slight doping with Ru atoms. Moreover, both the microstructure and the $1/f$ noise performance of a-Si$_{1-x}$Ru$_{x}$ thin films could be improved through a high-temperature annealing treatment.
收稿日期: 2018-07-05
出版日期: 2019-01-22
:
81.05.Gc
(Amorphous semiconductors)
68.55.jm
(Texture)
68.37.-d
(Microscopy of surfaces, interfaces, and thin films)
73.61.-r
(Electrical properties of specific thin films)
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