Effects of Three Typical Resistivity Models on Pulsed Inductive Plasma Acceleration Modeling
Xin-Feng Sun1, Yan-Hui Jia1, Tian-Ping Zhang1, Chen-Chen Wu1, Xiao-Dong Wen1, Ning Guo1, Hai Jin2**, Yu-Jun Ke1, Wei-Long Guo1
1National Key Laboratory of Science and Technology on Vacuum Technology and Physics, Lanzhou Institute of Physics, Lanzhou 730000 2College of Electrical and Information Engineering, Lanzhou University of Technology, Lanzhou 730050
Abstract：The effects of three different typical resistivity models (Spitzer, Z&L and M&G) on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear at the plasma temperature lower than 2.5 eV, and the maximum gap of the pulsed inductive plasma accelerated efficiency is approximately 2.5%. Moreover, the pulsed inductive plasma accelerated efficiency is absolutely related to the dynamic impedance parameters, such as voltage, inductance, capacitance and flow rate. However, the distribution of the efficiency as a function of plasma temperature with three resistivity models has nothing to do with the dynamic impedance parameter.
2017, Vol. 34 
