中国物理快报  2015, Vol. 32 Issue (08): 88501-088501    DOI: 10.1088/0256-307X/32/8/088501
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Impact of Band-Engineering to Performance of High-k Multilayer Based Charge Trapping Memory
LIU Li-Fang1**, PAN Li-Yang1,2**, ZHANG Zhi-Gang1, XU Jun1
1Institute of Microelectronics, Tsinghua University, Beijing 100084
2Graduate School at Shenzhen, Tsinghua University, Shenzhen 518055