Fabrication of Micro-Grooves in Silicon Carbide Using Femtosecond Laser Irradiation and Acid Etching
KHUAT Vanthanh1,2, MA Yun-Can1, SI Jin-Hai1**, CHEN Tao1, CHEN Feng1, HOU Xun1
1Key Laboratory for Physical Electronics and Devices of the Ministry of Education and Shaanxi Key Lab of Information Photonic Technique, School of Electronics and information Engineering, Xi'an Jiaotong University, Xi'an 710049 2Le Quy Don Technical University, Hanoi 7EN-248, Vietnam
Abstract：A simple method using an 800-nm femtosecond laser and chemical selective etching is developed for fabrication of high-aspect-ratio grooves in silicon carbide. Micro grooves with an aspect ratio of approximately 40 are obtained. The morphology and chemical compositions of the grooves are analyzed using a scanning electronic microscope equipped with an energy dispersive x-ray spectroscopy. The formation mechanism of SiC grooves is attributed to the chemical reactions of the laser induced structural changes with a mixed solution of hydrofluoric acid and nitric acid. In addition, the effects of laser irradiation parameters on the aspect ratio of the grooves are investigated.
2014, Vol. 31 
