Surface Oxidation Properties in a Topological Insulator Bi2 Te3 Film
GUO Jian-Hua, QIU Feng, ZHANG Yun, DENG Hui-Yong** , HU Gu-Jin, LI Xiao-Nan, YU Guo-Lin, DAI Ning**
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083
Abstract :Bi2 Te3 films are grown on (111)-oriented GaAs substrates by using the hot wall epitaxy method and the surface oxidation properties in the films are investigated by x-ray photoelectron spectroscopy, Raman spectroscopy, and x-ray diffraction. The results show that the films are c-axis oriented. Two pairs of new peaks in the XPS spectra involved with the binding energies from Bi 4f and Te 3d electrons correspond to Bi–O–Te bonds. Besides the A 1g 1 , Eg 2 andA 1g 2 vibration modes from Bi2 Te3 films, two new peaks at 93.5 cm?1 and 123 cm?1 are observed in Raman spectra, which are assigned to α -Bi2 O3 and TeO2 , respectively. Our results are helpful for analyzing the degradation mechanism of topological surface states in Bi2 Te3 .
收稿日期: 2013-04-10
出版日期: 2013-11-21
:
68.47.Fg
(Semiconductor surfaces)
81.15.Ef
82.80.Pv
(Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.))
引用本文:
. [J]. 中国物理快报, 2013, 30(10): 106801-106801.
GUO Jian-Hua, QIU Feng, ZHANG Yun, DENG Hui-Yong, HU Gu-Jin, LI Xiao-Nan, YU Guo-Lin, DAI Ning. Surface Oxidation Properties in a Topological Insulator Bi2 Te3 Film. Chin. Phys. Lett., 2013, 30(10): 106801-106801.
链接本文:
https://cpl.iphy.ac.cn/CN/10.1088/0256-307X/30/10/106801
或
https://cpl.iphy.ac.cn/CN/Y2013/V30/I10/106801
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