中国物理快报  2012, Vol. 29 Issue (2): 28501-028501    DOI: 10.1088/0256-307X/29/2/028501
  CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY 本期目录 | 过刊浏览 | 高级检索 |
AlGaN/GaN Metal-Insulator-Semiconductor High Electron-Mobility Transistor Using a NbAlO/Al2O3 Laminated Dielectric by Atomic Layer Deposition
BI Zhi-Wei1, HAO Yue1**, FENG Qian1, GAO Zhi-Yuan2, ZHANG Jin-Cheng1, MAO Wei1, ZHANG Kai1, MA Xiao-Hua1, LIU Hong-Xia1, YANG Lin-An1, MEI Nan1, CHANG Yong-Ming1
1Key Lab of Fundamental Science for National on Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071
2Lab of Photoelectronic Technology, School of Electronic and Control Engineering, Beijing University of Technology, Beijing 100124
AlGaN/GaN Metal-Insulator-Semiconductor High Electron-Mobility Transistor Using a NbAlO/Al2O3 Laminated Dielectric by Atomic Layer Deposition
BI Zhi-Wei1, HAO Yue1**, FENG Qian1, GAO Zhi-Yuan2, ZHANG Jin-Cheng1, MAO Wei1, ZHANG Kai1, MA Xiao-Hua1, LIU Hong-Xia1, YANG Lin-An1, MEI Nan1, CHANG Yong-Ming1
1Key Lab of Fundamental Science for National on Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071
2Lab of Photoelectronic Technology, School of Electronic and Control Engineering, Beijing University of Technology, Beijing 100124