摘要Helium contents of up to 30at.% are prepared in sputter-deposited Ti films. Isochronal annealing behaviors of helium including the depth profiles and the evolution of helium bubbles in the films at different temperatures are examined by ion beam analysis including Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA), as well as thermal helium desorption spectroscopy (THDS). It is found that the energy spreading induced by structural inhomogeneities in the spectra of RBS and ERDA as well as the increment in the width of spectra occurs, which corresponds to the change of stopping cross-section of helium atoms in the Ti film due to the change of physical-state of helium in the evolution of helium bubble. The ion beam analysis on the helium evolution is consistent with the THDS measurement. Ion beam technique opens interesting possibilities in the characterizing on the growth of helium bubbles.
Abstract：Helium contents of up to 30at.% are prepared in sputter-deposited Ti films. Isochronal annealing behaviors of helium including the depth profiles and the evolution of helium bubbles in the films at different temperatures are examined by ion beam analysis including Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA), as well as thermal helium desorption spectroscopy (THDS). It is found that the energy spreading induced by structural inhomogeneities in the spectra of RBS and ERDA as well as the increment in the width of spectra occurs, which corresponds to the change of stopping cross-section of helium atoms in the Ti film due to the change of physical-state of helium in the evolution of helium bubble. The ion beam analysis on the helium evolution is consistent with the THDS measurement. Ion beam technique opens interesting possibilities in the characterizing on the growth of helium bubbles.
ZHANG Lei;HE Zhi-Jiang;LIU Chao-Zhuo;WANG Xu-Fei;SHI Li-Qun**. Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering[J]. 中国物理快报, 2012, 29(1): 12501-012501.
ZHANG Lei, HE Zhi-Jiang, LIU Chao-Zhuo, WANG Xu-Fei, SHI Li-Qun**. Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering. Chin. Phys. Lett., 2012, 29(1): 12501-012501.
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FAISAL Jamil-Qureshi;LOU Jian-Ling;YE Yan-Lin;CAO Zhong-Xin;JIANG Dong-Xing;ZHENG Tao;HUA Hui;LI Zhi-Huan;LI Xiang-Qing;GE Yu-Cheng;PANG Dan-Yang;LI Qi-Te;XIAO Jun;LV Lin-Hui;QIAO Rui;YOU Hai-Bo;CHEN Rui-Jiu;LU Fei;Sakurai H;Otsu H;Nishimura M;Sakaguchi S;Baba H;Togano Y;Yoneda K;LI Chen;WANG Shuo;WANG He;LI Kuo-Ang;Nakamura T;Nakayama Y;Kondo Y;Deguchi S;Satou Y;Tshoo K H. Elastic Scattering of 6He + p at 82.3MeV/nucleon[J]. 中国物理快报, 2010, 27(9): 92501-092501.
2012, Vol. 29 
