Observation of Hot Electrons in Surface-Wave Plasmas Excited by Surface Plasmon Polaritons
HU Ye-Lin1, CHEN Zhao-Quan1,2**, LIU Ming-Hai2**, HONG Ling-Li1, LI Ping1, ZHENG Xiao-Liang1, XIA Guang-Qing3**, HU Xi-Wei2
1College of Electrical and Information Engineering, Anhui University of Science and Technology, Huainan 232001 2State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074 3State Key Laboratory of Structure Analysis for Industrical Equipment, Dalian University of Technology, Dalian 116024
Observation of Hot Electrons in Surface-Wave Plasmas Excited by Surface Plasmon Polaritons
HU Ye-Lin1, CHEN Zhao-Quan1,2**, LIU Ming-Hai2**, HONG Ling-Li1, LI Ping1, ZHENG Xiao-Liang1, XIA Guang-Qing3**, HU Xi-Wei2
1College of Electrical and Information Engineering, Anhui University of Science and Technology, Huainan 232001 2State Key Laboratory of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074 3State Key Laboratory of Structure Analysis for Industrical Equipment, Dalian University of Technology, Dalian 116024
摘要The electron energy distribution functions (EEDFs) are studied in the planar-type surface-wave plasma (SWP) caused by resonant excitation of surface plasmon polaritons (SPPs) using a single cylindrical probe. Sustained plasma characteristics can be considered as a bi-Maxwellian EEDF, which correspond to a superposition of the bulk low-temperature electron and the high-energy electron beam-like part. The beam component energy is pronounced at about 10 eV but the bulk part is lower than 3.5 eV. The hot electrons included in the proposed plasmas play a significant role in plasma heating and further affect the discharge chemistry.
Abstract:The electron energy distribution functions (EEDFs) are studied in the planar-type surface-wave plasma (SWP) caused by resonant excitation of surface plasmon polaritons (SPPs) using a single cylindrical probe. Sustained plasma characteristics can be considered as a bi-Maxwellian EEDF, which correspond to a superposition of the bulk low-temperature electron and the high-energy electron beam-like part. The beam component energy is pronounced at about 10 eV but the bulk part is lower than 3.5 eV. The hot electrons included in the proposed plasmas play a significant role in plasma heating and further affect the discharge chemistry.
HU Ye-Lin;CHEN Zhao-Quan;**;LIU Ming-Hai**;HONG Ling-Li;LI Ping;ZHENG Xiao-Liang;XIA Guang-Qing**;HU Xi-Wei
. Observation of Hot Electrons in Surface-Wave Plasmas Excited by Surface Plasmon Polaritons[J]. 中国物理快报, 2011, 28(11): 115201-115201.
HU Ye-Lin, CHEN Zhao-Quan, **, LIU Ming-Hai**, HONG Ling-Li, LI Ping, ZHENG Xiao-Liang, XIA Guang-Qing**, HU Xi-Wei
. Observation of Hot Electrons in Surface-Wave Plasmas Excited by Surface Plasmon Polaritons. Chin. Phys. Lett., 2011, 28(11): 115201-115201.
[1] Sugai H, Ghanashev I and Mizuno K 2000 Appl. Phys. Lett. 77 3523
[2] Kudela J, Terebessy T and Kando M 2000 Appl. Phys. Lett. 76 1249
[3] Terebessy T, Kando M and Kudela J 2000 Appl. Phys. Lett. 77 2825
[4] Širý M, Husárik J and Kando M 2007 Appl. Phys. Lett. 91 071501
[5] Terebessy T, Širý M, Kando M, Kudela J and Korzec D 2003 Appl. Phys. Lett. 82 694
[6] Nagatsu M, Niwa T and Sugai H 2002 Appl. Phys. Lett. 81 1966
[7] Xu X, Liu F, Zhou Q H, Liang B, Liang Y Z and Liang R Q 2008 Appl. Phys. Lett. 92 011501
[8] Liang Y Z, Ou Q R, Liang Bo and Liang R Q 2008 Chin. Phys. Lett. 25 1761
[9] Chen Z Q, Liu M H, Tang L, Hu P and Hu X W 2009 J. Appl. Phys. 106 013314
[10] Chen Z Q, Liu M H, Tang L, Lv J H, Wen Y F and Hu X W 2009 J. Appl. Phys. 106 063304
[11] Chen Z Q, Liu M H, Hong L L, Zhou Q Y, Cheng L L and Hu X W 2011 Phys. Plasmas 18 013505
[12] Chen Z Q, Liu M H, Zhou Q Y, Hu Y L, Zhu L J and Hu X W 2011 Chin. Phys. Lett. 28 045201
[13] Chen Z Q, Liu M H, Tang L, Lv J H and Hu X W 2010 Chin. Phys. Lett. 27 025205
[14] Knappmiller S, Robertson S and Sternovsky Z 2006 Phys. Rev. E 73 066402
[15] Sternovsky Z andRobertson S 2004 Phys. Plasmas 11 3610
[16] Chen Z Q, Liu M H, Zhou P Q, Chen W, Lan C H and Hu X W 2008 Plasma Sci. Technol. 10 655
[17] Sugai H, Ghanashev I, Hosokawa M, Mizuno K, Nakamura K, Toyoda H and Yamauchi K 2001 Plasma Sources Sci. Technol. 10 378
[18] Aliev Y M, Bychenkov V Y, Maximov A andSchlüter H 1992 Plasma Sources Sci. Technol. 1 126