摘要Homo-epitaxial layers are successfully grown on Si-face 4° off−axis 4H-SiC substrates using the horizontal hot-wall chemical vapor deposition system. The smooth surface without morphological defects is obtained by the optimized in situ etching process and growth temperature. Schottky diodes fabricated on the epilayer present a typical I–V characteristic. This is the first report of Schottky diodes fabricated on 4° off-axis 4H-SiC substrates made in China.
Abstract:Homo-epitaxial layers are successfully grown on Si-face 4° off−axis 4H-SiC substrates using the horizontal hot-wall chemical vapor deposition system. The smooth surface without morphological defects is obtained by the optimized in situ etching process and growth temperature. Schottky diodes fabricated on the epilayer present a typical I–V characteristic. This is the first report of Schottky diodes fabricated on 4° off-axis 4H-SiC substrates made in China.
LI Zhe-Yang;**;HAN Ping;LI Yun;NI Wei-Jiang;BAO Hui-Qiang;LI Yu-Zhu
. Epitaxial Growth of 4H-SiC on 4° Off-Axis Substrate for Power Devices[J]. 中国物理快报, 2011, 28(9): 98101-098101.
LI Zhe-Yang, **, HAN Ping, LI Yun, NI Wei-Jiang, BAO Hui-Qiang, LI Yu-Zhu
. Epitaxial Growth of 4H-SiC on 4° Off-Axis Substrate for Power Devices. Chin. Phys. Lett., 2011, 28(9): 98101-098101.
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