Spectral Resolution Improvement of Mo/Si Multilayers
WU Wen-Juan1**, WANG Zhan-Shan2, ZHU Jing-Tao2, ZHANG Zhong2, WANG Feng-Li2, CHEN Ling-Yan2, ZHOU Hong-Jun3, HUO Tong-Lin3
1College of Sciences, Shanghai Institute of Technology, Shanghai 201418 2Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092 3National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
Spectral Resolution Improvement of Mo/Si Multilayers
WU Wen-Juan1**, WANG Zhan-Shan2, ZHU Jing-Tao2, ZHANG Zhong2, WANG Feng-Li2, CHEN Ling-Yan2, ZHOU Hong-Jun3, HUO Tong-Lin3
1College of Sciences, Shanghai Institute of Technology, Shanghai 201418 2Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092 3National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
摘要Theoretically, the spectral resolution of a multilayer can be improved through a combination of utilizing high reflectance orders and by decreasing the thickness of the scattering layer. We fabricate Mo/Si multilayers in the first, second, third, fourth and fifth reflectance orders with Mo layer thicknesses of 3.0 nm and 2.0 nm, respectively, using direct current magnetron sputtering. The structure of the multilayers is characterized with a grazing angle x-ray diffractometer (XRD). Then the reflectivity of the multilayers is measured in a synchrotron radiation facility. The results show that the spectral resolution increases with the increasing reflectance order and with the decreasing Mo layer thickness. The highest spectral resolution is improved to 117.5 in the 5th order for dMo=2 nm, where the reflectivity is 18%.
Abstract：Theoretically, the spectral resolution of a multilayer can be improved through a combination of utilizing high reflectance orders and by decreasing the thickness of the scattering layer. We fabricate Mo/Si multilayers in the first, second, third, fourth and fifth reflectance orders with Mo layer thicknesses of 3.0 nm and 2.0 nm, respectively, using direct current magnetron sputtering. The structure of the multilayers is characterized with a grazing angle x-ray diffractometer (XRD). Then the reflectivity of the multilayers is measured in a synchrotron radiation facility. The results show that the spectral resolution increases with the increasing reflectance order and with the decreasing Mo layer thickness. The highest spectral resolution is improved to 117.5 in the 5th order for dMo=2 nm, where the reflectivity is 18%.
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2011, Vol. 28 
