Numerical Reproduction of Spatio-Temporal Evolution of Surface Plasmon Polaritons at Dielectric-Plasma Interface
CHEN Zhao-Quan1,2**, LIU Ming-Hai2***, ZHOU Qi-Yan2, HU Ye-Lin1, YANG An1, ZHU Long-Ji1, HU Xi-Wei2
1College of Electrical and Information Engineering, Anhui University of Science and Technology, Huainan 232001 2College of Electrical and Electronic Engineering, Huazhong University of Science and Technology, Wuhan 430074
Numerical Reproduction of Spatio-Temporal Evolution of Surface Plasmon Polaritons at Dielectric-Plasma Interface
CHEN Zhao-Quan1,2**, LIU Ming-Hai2***, ZHOU Qi-Yan2, HU Ye-Lin1, YANG An1, ZHU Long-Ji1, HU Xi-Wei2
1College of Electrical and Information Engineering, Anhui University of Science and Technology, Huainan 232001 2College of Electrical and Electronic Engineering, Huazhong University of Science and Technology, Wuhan 430074
摘要Discharges in planar-type overdense plasmas caused by resonant excitation of surface plasmon polaritons (SPPs) are presented. The spatio-temporal evolution of surface waves of SPPs at the dielectric-plasma interface is reproduced numerically. It is found that different discharge light patterns are excited by different spatio-temporal wave fields. Moreover, the corrugation surface included in the proposed plasma sources plays a significant role in producing large-area uniform plasmas.
Abstract:Discharges in planar-type overdense plasmas caused by resonant excitation of surface plasmon polaritons (SPPs) are presented. The spatio-temporal evolution of surface waves of SPPs at the dielectric-plasma interface is reproduced numerically. It is found that different discharge light patterns are excited by different spatio-temporal wave fields. Moreover, the corrugation surface included in the proposed plasma sources plays a significant role in producing large-area uniform plasmas.
[1] Sugai H, Ghanashev I and Nagatsu M 1998 Plasma Sources Sci. Technol. 7 192
[2] Nagatsu M, Naito K, Ogino A and Nanko S 2006 Plasma Sources Sci. Technol. 15 37
[3] Ghanashev I and Sugai H 2000 Phys. Plasmas 7 3051
[4] Wu C F, Zhan R J, Wen X H and Huang W D 2001 IEEE Trans. Plas. Sci. 29 13
[5] Chen Z Q, Liu M H, Zhou P Q, Chen W, Lan C H and Hu X W 2008 Plasma Sci. Technol. 10 655
[6] Xu X, Liu F, Zhou Q H, Liang B, Liang Y Z and Liang R Q 2008 Appl. Phys. Lett. 92 011501
[7] Chen Z Q, Liu M H, Lan C H, Chen W, Luo Z Q and Hu X W 2008 Chin. Phys. Lett. 25 4333
[8] Liang Y Z, Ou Q R, Liang Bo and Liang R Q 2008 Chin. Phys. Lett. 25 1761
[9] Chen Z Q, Liu M H, Liu Y P, Chen W, Luo Z Q and Hu X W 2009 Acta. Phys. Sin. 58 679
[10] Henriques J, Tatarova E and Dias F M 2008 J. Appl. Phys. 103 103304
[11] Toba T and Katsurai M 2002 IEEE Trans. Plasma Sci. 30 2095
[12] Denysenko I B, Gapon A V, Azarenkov N A, Ostrikov K N and Yu M Y 2002 Phys. Rev. E 65 046419
[13] Chen Z Q, Liu M H, Lan C H, Chen W, Tang L, Luo Z Q, Yan B R, Lv J H and Hu X W 2009 Chin. Phys. B 18 3484
[14] Lan C H, Lan C Z, Hu X W, Chen Z Q and Liu M H 2009 Chin. Phys. B 18 2412
[15] Lan C H, Hu X W and Liu M H 2009 Chin. Phys. Lett. 26 035204
[16] Chen Z Q, Liu M H, Tang L, Hu P and Hu X W 2009 J. Appl. Phys. 106 013314
[17] Chen Z Q, Liu M H, Tang L, Lv J H, Wen Y F and Hu X W 2009 J. Appl. Phys. 106 063304
[18] Chen Z Q, Liu M H, Tang L, Lv J H and Hu X W 2010 Chin. Phys. Lett. 27 025205
[19] Ganachev I P and Sugai H 2005 Surface Coatings Technol. 200 792
[20] Jain A P and Parashar J 2005 J. Phys. 65 311