Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by Direct-Current Pulse Magnetron Sputtering
WANG Hua-Lin, DING Wan-Yu, LIU Chao-Qian, CHAI Wei-Ping
School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028 Engineering Research Center of Optoelectronic Materials and Devices, Education Department of Liaoning Province, Dalian 116028
Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by Direct-Current Pulse Magnetron Sputtering
WANG Hua-Lin, DING Wan-Yu, LIU Chao-Qian, CHAI Wei-Ping
School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028 Engineering Research Center of Optoelectronic Materials and Devices, Education Department of Liaoning Province, Dalian 116028
摘要Indium tin oxide (ITO) films were deposited on glass substrates at room temperature by dc pulse magnetron sputtering. Varying O2 flux, ITO films with different properties are obtained. Both x−ray diffractometer and x-ray photoelectron spectrometer are used to study the change of crystalline structures and bonding structures of ITO films, respectively. Electrical properties are measured by four-point probe measurements. The results indicate that the chemical structures and compositions of ITO films strongly depend on the O2 flux. With increasing O2 flux, ITO films display better crystallization, which could decrease the resistivity of films. On the contrary, ITO films contain less O vacancies with increasing O2 flux, which could worsen the conductive properties of films. Without any heat treatment onto the samples, the resistivity of the ITO film could reach 6.0×10−4Ω⋅cm, with the optimal deposition parameter of 0.2 sccm O2 flux.
Abstract：Indium tin oxide (ITO) films were deposited on glass substrates at room temperature by dc pulse magnetron sputtering. Varying O2 flux, ITO films with different properties are obtained. Both x−ray diffractometer and x-ray photoelectron spectrometer are used to study the change of crystalline structures and bonding structures of ITO films, respectively. Electrical properties are measured by four-point probe measurements. The results indicate that the chemical structures and compositions of ITO films strongly depend on the O2 flux. With increasing O2 flux, ITO films display better crystallization, which could decrease the resistivity of films. On the contrary, ITO films contain less O vacancies with increasing O2 flux, which could worsen the conductive properties of films. Without any heat treatment onto the samples, the resistivity of the ITO film could reach 6.0×10−4Ω⋅cm, with the optimal deposition parameter of 0.2 sccm O2 flux.
WANG Hua-Lin;DING Wan-Yu;LIU Chao-Qian;CHAI Wei-Ping. Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by Direct-Current Pulse Magnetron Sputtering[J]. 中国物理快报, 2010, 27(12): 127302-127302.
WANG Hua-Lin, DING Wan-Yu, LIU Chao-Qian, CHAI Wei-Ping. Influence of O2 Flux on Compositions and Properties of ITO Films Deposited at Room Temperature by Direct-Current Pulse Magnetron Sputtering. Chin. Phys. Lett., 2010, 27(12): 127302-127302.
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