中国物理快报  2008, Vol. 25 Issue (3): 1128-1130    
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Effect of Post-Annealing on Microstructural and Electrical Properties of N+ Ion-Implanted into ZnO:In Films
KONG Chun-Yang, QIN Guo-Ping, RUAN Hai-Bo, NAN Mao, ZHU Ren-Jiang,
DAI Te-Li
College of Physics and information Technology, Chongqing Normal University, Chongqing 400047
Effect of Post-Annealing on Microstructural and Electrical Properties of N+ Ion-Implanted into ZnO:In Films
KONG Chun-Yang;QIN Guo-Ping;RUAN Hai-Bo;NAN Mao;ZHU Ren-Jiang,
DAI Te-Li
College of Physics and information Technology, Chongqing Normal University, Chongqing 400047