摘要A silicon dioxide film is deposited on the polyethyleneterephtalate (PET) by a penning discharge plasma source at ambient temperature in a high vacuum chamber. Hexamethyldisiloxane and oxygen are adopted as precursor and reactive reagent to grow a nano-scale silicon dioxide layer on polymer surfaces. For the chemical structure analysis x-ray photoelectron spectroscopy is performed to demonstrate the content of Si, O and C elements. It is noticed that a higher silicon concentration is contained if Ar plasma is used for pretreatment. X-ray diffraction analysis shows that a micro-crystal silicon dioxide is formed by peak patterns at 25.84° and 21.8°. The barrier properties examined by oxygen transmission rate show that the permeation parameter of the 12-μm-thick PET film drastically decreases from 135cc/m2 per day for the control one to 0.713cc/m2 per day for the as-deposited one after Ar plasma treatment. The surface morphology related to the barrier properties of SiOx-coated polymers os also investigated by scanning electron microscopy and atomic force microscopy.
Abstract：A silicon dioxide film is deposited on the polyethyleneterephtalate (PET) by a penning discharge plasma source at ambient temperature in a high vacuum chamber. Hexamethyldisiloxane and oxygen are adopted as precursor and reactive reagent to grow a nano-scale silicon dioxide layer on polymer surfaces. For the chemical structure analysis x-ray photoelectron spectroscopy is performed to demonstrate the content of Si, O and C elements. It is noticed that a higher silicon concentration is contained if Ar plasma is used for pretreatment. X-ray diffraction analysis shows that a micro-crystal silicon dioxide is formed by peak patterns at 25.84° and 21.8°. The barrier properties examined by oxygen transmission rate show that the permeation parameter of the 12-μm-thick PET film drastically decreases from 135cc/m2 per day for the control one to 0.713cc/m2 per day for the as-deposited one after Ar plasma treatment. The surface morphology related to the barrier properties of SiOx-coated polymers os also investigated by scanning electron microscopy and atomic force microscopy.
SUN Yun-Jin;FU Ya-Bo;CHEN Qiang;ZHANG Chun-Mei;SANG Li-Jun;ZHANG Yue-Fei. Silicon Dioxide Coating Deposited by PDPs on PET Films and Influence on Oxygen Transmission Rate[J]. 中国物理快报, 2008, 25(5): 1753-1756.
SUN Yun-Jin, FU Ya-Bo, CHEN Qiang, ZHANG Chun-Mei, SANG Li-Jun, ZHANG Yue-Fei. Silicon Dioxide Coating Deposited by PDPs on PET Films and Influence on Oxygen Transmission Rate. Chin. Phys. Lett., 2008, 25(5): 1753-1756.
[1] Moosheimer U and Bichler C H 1999 Surf. CoatingsTechnol. 116 812 [2] Wuua D S, Loa W C, Changa L S and Horng R H 2004 ThinSolid Films 468 105 [3] Madocks J and Rewhinkle J 2004 Packaging Barrier FilmsDeposited on PET by PECVD Using New High Density Plasma Source, SVCAnnual Technical Conference (Tucson, AZ) p 10 [4] Hegemann D, Brunner H and Oehr C 2001 Surf. CoatingsTechnol. 142 849 [5] Fang Z, Luo Y, Qiu Y C, Yang Y and Xu D W 2003 VacuumSci. Technol. 6 408 (in Chinese) [6] Leterrier Y 2003 Prog. Mater. Sci. 48 6 [7] Czeremuszkin G, Latreche M, Wertheimer M and Sobrinho A S2001 Plasmas and Polymers 6 108 [8] Goujona M, Belmonte T and Henrion G 2004 Surf.Coatings Technol. 188 756 [9] Fracassi F, Agostino R D, Fanelli F, Fornelli A andPalumbo F 2003 Plasmas and Polymers 8 260 [10] Yoshida K, Mori S, Kishimoto Y, Ohuchi H, Hasegawa H,Shimozuma M and Tagashira H 2005 J. Phys. D: Appl. Phys. 38 1921
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