Fluorescence Enhancement Ratio Dropdown at Low Fluences during Femtosecond Double Pulse Laser Ablation
Sima SINGHA2, Robert J. GORDON2, HU Zhan1
1Institute of Atomic and Molecular Physics, Jilin University, Changchun 1300212Department of Chemistry, University of Illinois at Chicago, Chicago, Illinois 60607-7061, USA
Fluorescence Enhancement Ratio Dropdown at Low Fluences during Femtosecond Double Pulse Laser Ablation
Sima SINGHA2, Robert J. GORDON2, HU Zhan1
1Institute of Atomic and Molecular Physics, Jilin University, Changchun 1300212Department of Chemistry, University of Illinois at Chicago, Chicago, Illinois 60607-7061, USA
In the study of double pulse ablation of materials (silicon and copper), a dropdown of double pulse to single pulse fluorescence signal enhancement at low fluences is observed. The dropdown is analysed with a simple theoretical one-dimensional heat diffusion model and verified by fluorescence time constants change as a function of fluence. The dropdown is explained as a result of liquid-solid mixture layer at the liquid and solid boundary. The effect of the layer becomes important at low fluences.
In the study of double pulse ablation of materials (silicon and copper), a dropdown of double pulse to single pulse fluorescence signal enhancement at low fluences is observed. The dropdown is analysed with a simple theoretical one-dimensional heat diffusion model and verified by fluorescence time constants change as a function of fluence. The dropdown is explained as a result of liquid-solid mixture layer at the liquid and solid boundary. The effect of the layer becomes important at low fluences.
Sima SINGHA;Robert J. GORDON;HU Zhan. Fluorescence Enhancement Ratio Dropdown at Low Fluences during Femtosecond Double Pulse Laser Ablation[J]. 中国物理快报, 2008, 25(7): 2653-2656.
Sima SINGHA, Robert J. GORDON, HU Zhan. Fluorescence Enhancement Ratio Dropdown at Low Fluences during Femtosecond Double Pulse Laser Ablation. Chin. Phys. Lett., 2008, 25(7): 2653-2656.
2008, Vol. 25 
