X-Ray Nonspecular Scattering from Amorphous Mo Films
MA Hong-ji, JIANG Xiao-ming, CUI Ming-qi, XIAN Ding-chang
Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100039
X-Ray Nonspecular Scattering from Amorphous Mo Films
MA Hong-ji;JIANG Xiao-ming;CUI Ming-qi;XIAN Ding-chang
Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100039
关键词 ：
61.10.-i ,
68.55.Jk ,
81.15.Cd
Abstract ： X-ray nonspecular scattering method is used to study the structures of Mo thin films fabricated with magnetron sputtering under different Ar pressures. The results show that with the increase of Ar pressure, the density of amorphous Mo film decreased; the surface roughness of the films increased, while the surface coherent length decreased. The abnormal glow discharging in the sputtering processes interprets the observed results well.
Key words ：
61.10.-i
68.55.Jk
81.15.Cd
出版日期: 1997-03-01
引用本文:
MA Hong-ji;JIANG Xiao-ming;CUI Ming-qi;XIAN Ding-chang. X-Ray Nonspecular Scattering from Amorphous Mo Films[J]. 中国物理快报, 1997, 14(3): 190-193.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1997/V14/I3/190
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