Experimental Study of the Plasma Fluorination of Y-Ba-Cu-O Thin
Films
LI Qin1, FU Ze-Lu1, JI Zheng-Ming1, FENG Yi-Jun1, KANG Lin1, YANG Sen-Zu1, WU Pei-Heng1, WANG Xiao-Shu2, YE Yu-Da2
1Institute of Superconductor Electronics, Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093
2Modern Analysis Center, Nanjing University, Nanjing 210093
Experimental Study of the Plasma Fluorination of Y-Ba-Cu-O Thin
Films
LI Qin1;FU Ze-Lu1;JI Zheng-Ming1;FENG Yi-Jun1;KANG Lin1;YANG Sen-Zu1;WU Pei-Heng1;WANG Xiao-Shu2;YE Yu-Da2
1Institute of Superconductor Electronics, Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093
2Modern Analysis Center, Nanjing University, Nanjing 210093
Abstract： We have experimentally studied the surface modifications of the
Y-Ba-Cu-O (YBCO) thin films by CF4 plasma. The intensity of the plasma fluorination was controlled by changing the biasing voltage and the time of the plasma treatment. Microstructure analyses reveal that the oxygen content of the YBCO thin films had been changed. Transport measurements of sufficient fluorinated YBCO films imply that the films had been changed totally into an oxygen-deficient semi-conducting state. From these experimental results we believe that the plasma fluorination is a quite useful method to form controllable thin barrier layer in fabricating interface engineered junctions and to form a stable narrow weak-link region in fabricating planar superconductor-normal-superconductor junctions.
LI Qin;FU Ze-Lu;JI Zheng-Ming;FENG Yi-Jun;KANG Lin;YANG Sen-Zu;WU Pei-Heng;WANG Xiao-Shu;YE Yu-Da. Experimental Study of the Plasma Fluorination of Y-Ba-Cu-O Thin
Films[J]. 中国物理快报, 2002, 19(9): 1340-1343.
LI Qin, FU Ze-Lu, JI Zheng-Ming, FENG Yi-Jun, KANG Lin, YANG Sen-Zu, WU Pei-Heng, WANG Xiao-Shu, YE Yu-Da. Experimental Study of the Plasma Fluorination of Y-Ba-Cu-O Thin
Films. Chin. Phys. Lett., 2002, 19(9): 1340-1343.
2002, Vol. 19 
