Fabrication of 11-nm-Wide Silica-Like Lines Using X-Ray Diffraction Exposure
ZHU Xiao-Li1,2, XIE Chang-Qing2, ZHANG Man-Hong2, LIU Ming2, CHEN Bao-Qin2, PAN Feng1
1Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 1000842Key Laboratory of Nano-fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029
Fabrication of 11-nm-Wide Silica-Like Lines Using X-Ray Diffraction Exposure
ZHU Xiao-Li1,2, XIE Chang-Qing2, ZHANG Man-Hong2, LIU Ming2, CHEN Bao-Qin2, PAN Feng1
1Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 1000842Key Laboratory of Nano-fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029
摘要Fine silica-like lines with 11 nm width are successfully fabricated using x-ray Fresnel diffraction exposure. X-rays pass a mask of 175-nm-wide lines and 125-nm-wide spaces and form sharp peaks on a wafer coated with a layer of hydrogen silsesquioxane resist (HSQ). By precisely controlling the mask-wafer gap at 10μm using the laser interferogram method, the fine structures are defined on HSQ. Experimental images are reproduced by a simulation using the one-dimensional beam propagation method. This lithographic technique presents a novel and convenient way to fabricate fine silica-like structures and devices in nano-optical and nanoelectronic applications.
Abstract：Fine silica-like lines with 11 nm width are successfully fabricated using x-ray Fresnel diffraction exposure. X-rays pass a mask of 175-nm-wide lines and 125-nm-wide spaces and form sharp peaks on a wafer coated with a layer of hydrogen silsesquioxane resist (HSQ). By precisely controlling the mask-wafer gap at 10μm using the laser interferogram method, the fine structures are defined on HSQ. Experimental images are reproduced by a simulation using the one-dimensional beam propagation method. This lithographic technique presents a novel and convenient way to fabricate fine silica-like structures and devices in nano-optical and nanoelectronic applications.
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2009, Vol. 26 
