Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources
WANG Kai-Ge1,2, WANG Lei3, LIU Wen-Qing2, NIU Han-Ben1
1Institute of Optoelectronics, Shenzhen University, Shenzhen 518060
2Anhui Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Hefei 230031
3Xi’an Institute of Applied Optics, Xi’an 710065
Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources
WANG Kai-Ge1,2;WANG Lei3;LIU Wen-Qing2;NIU Han-Ben1
1Institute of Optoelectronics, Shenzhen University, Shenzhen 518060
2Anhui Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Hefei 230031
3Xi’an Institute of Applied Optics, Xi’an 710065
Abstract： The construct and electrode potential of emitting systems are very important for the portable ultrahigh brightness microfocus x-ray sources. The ratio of Dw/H (Dw is the diameter of Wehnelt grid aperture and H is the setting height of the cathode) and the grid bias are determinative parameters for the emission current and focus properties of an electron beam. The Monte Carlo method is used to numerically calculate the electron beam trajectories within a microfocus x-ray tube. The calculated results indicate that an optimum source system with the electron beam focal spot diameter smaller than 10μm at the anode, reasonable short focal length of about 76mm and the cathode emission current of more than 30mA can be attained under conditions of Dw/H =5 and grid bias Vg= -0.6kV.
WANG Kai-Ge;WANG Lei;LIU Wen-Qing;NIU Han-Ben. Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources[J]. 中国物理快报, 2006, 23(9): 2368-2371.
WANG Kai-Ge, WANG Lei, LIU Wen-Qing, NIU Han-Ben. Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources. Chin. Phys. Lett., 2006, 23(9): 2368-2371.
2006, Vol. 23 
