Removal of NO Molecules by a Novel Atmospheric Pressure Plasma Apparatus
LIU Xiu-Jun1,2, CHEN Guang-Liang2, CHEN Shi-Hua3, QIAN Feng4, FENG Ke-Cheng1, YANG Si-Ze2
1College of Science, Changchun University of Science and Technology, Changchun 130022
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Department of Civil and Environmental Engineering, Rensselaer Polytechnic Institute, 110 8th street, Troy, NY 12180, USA
4Department of Environment Engineering, Beijing Technology and Business University, Beijing 100037
Removal of NO Molecules by a Novel Atmospheric Pressure Plasma Apparatus
LIU Xiu-Jun1,2;CHEN Guang-Liang2;CHEN Shi-Hua3;QIAN Feng4;FENG Ke-Cheng1;YANG Si-Ze2
1College of Science, Changchun University of Science and Technology, Changchun 130022
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Department of Civil and Environmental Engineering, Rensselaer Polytechnic Institute, 110 8th street, Troy, NY 12180, USA
4Department of Environment Engineering, Beijing Technology and Business University, Beijing 100037
Abstract： A novel atmospheric pressure plasma apparatus (APPA) is designed with a liquid electrode, and its discharging characteristics are studied. Relatively uniform and intense discharge can be realized in the APPA system. An experimental study on removal of NO molecules is carried out by using the APPA, and more than 95.5% of NO is decomposed when the NO initial concentration is lower than 400ppm. Removal of NO efficiency increases rapidly with the increasing discharge power. Compared with the absence of O2, more NO2 is generated with the increase of O2 concentration. However, most of the NO molecules are decomposed to N2 and O2 directly, when O2 concentration changes from 0 to 1.1vol%.
(Plasma reactions (including flowing afterglow and electric discharges))
引用本文:
LIU Xiu-Jun;CHEN Guang-Liang;CHEN Shi-Hua;QIAN Feng;FENG Ke-Cheng;YANG Si-Ze. Removal of NO Molecules by a Novel Atmospheric Pressure Plasma Apparatus[J]. 中国物理快报, 2006, 23(10): 2827-2829.
LIU Xiu-Jun, CHEN Guang-Liang, CHEN Shi-Hua, QIAN Feng, FENG Ke-Cheng, YANG Si-Ze. Removal of NO Molecules by a Novel Atmospheric Pressure Plasma Apparatus. Chin. Phys. Lett., 2006, 23(10): 2827-2829.
2006, Vol. 23 
