1Department of Physics, Tongji University, Shanghai 200092
2Department of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004
Atom Lithography with a Chromium Atomic Beam
ZHANG Wen-Tao1,2;LI Tong-Bao1
1Department of Physics, Tongji University, Shanghai 200092
2Department of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004
Abstract： Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of 52Cr through an off-resonant laser standing wave with the wavelength of 425.55nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3nm with height of 1nm.
ZHANG Wen-Tao;LI Tong-Bao. Atom Lithography with a Chromium Atomic Beam[J]. 中国物理快报, 2006, 23(11): 2952-2955.
ZHANG Wen-Tao, LI Tong-Bao. Atom Lithography with a Chromium Atomic Beam. Chin. Phys. Lett., 2006, 23(11): 2952-2955.
2006, Vol. 23 
