Abstract： We present a new method utilizing a high-power-density plasma for depositing diamond-like carbon (DLC) films. The main advantage of this technique is the possibility that films with good adhesion to the substrate can be prepared under room temperature and low pressure. The DLC films are deposited on the silicon substrate successfully. The structure of the DLC films was characterized by high energy electron diffraction, scanning electron microscopy, Raman spectroscopy, x-ray photoelectron spectroscopy, and infrared absorption spectrum.
YAN Pengxun;YANG Si-ze;YANG Jie;LI Qing;LI Bing;LIU Chizi;CHEN Xishen. High-Power-Density Plasma Deposition of Diamond-Like
Carbons Films
[J]. 中国物理快报, 1994, 11(9): 558-560.
YAN Pengxun, YANG Si-ze, YANG Jie, LI Qing, LI Bing, LIU Chizi, CHEN Xishen. High-Power-Density Plasma Deposition of Diamond-Like
Carbons Films
. Chin. Phys. Lett., 1994, 11(9): 558-560.
1994, Vol. 11 
