Intensity Tuning in Single Mode Microchip Nd:YAG Laser with External Cavity
TAN Yi-Dong , ZHANG Shu-Lian
The State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084
Intensity Tuning in Single Mode Microchip Nd:YAG Laser with External Cavity
TAN Yi-Dong ;ZHANG Shu-Lian
The State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084
关键词 ：
42.55.Xi ,
42.55.Rz ,
42.60.Jf
Abstract ： We investigate the characteristics of intensity tuning in a single mode microchip Nd:YAG laser with an external cavity. The undulation of laser intensity in a period of λ/2 change of the internal cavity length is observed. Two different optical feedback cases are performed. One is an external cavity reflector perfectly aligned and the other is an external cavity reflector tilted. However, the fluctuation frequency of laser intensity in a period of λ/2 change of the internal cavity length in these two cases is found to be determined by the ratio of external cavity length to internal cavity length. Meanwhile, for the tilted external cavity, the fluctuation frequency is also related to multiple feedbacks in the tilted external cavity.
Key words ：
42.55.Xi
42.55.Rz
42.60.Jf
出版日期: 2006-12-01
:
42.55.Xi
(Diode-pumped lasers)
42.55.Rz
(Doped-insulator lasers and other solid state lasers)
42.60.Jf
(Beam characteristics: profile, intensity, and power; spatial pattern formation)
引用本文:
TAN Yi-Dong;ZHANG Shu-Lian. Intensity Tuning in Single Mode Microchip Nd:YAG Laser with External Cavity[J]. 中国物理快报, 2006, 23(12): 3271-3274.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2006/V23/I12/3271
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