Microstructure and Electron Conduction Mechanism of Hydrogenated Nano-crystalline Silicon Films
HE Yuliang1,4, CHU Yiming2,4, LIN Hongyi3, JIANG Shusheng4
1The Amorphous Physics Research Laboratory Beijing University of Aeronautics and Astronautics, Beijing 100083
2Beijing Laboratory of Electronic Microscopy, Academia Sinica, Beijing 100080
3Department of Electronic Engineering, Beijing Institute of Technology, Beijing 100081
4Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008
Microstructure and Electron Conduction Mechanism of Hydrogenated Nano-crystalline Silicon Films
HE Yuliang1,4;CHU Yiming2,4;LIN Hongyi3;JIANG Shusheng4
1The Amorphous Physics Research Laboratory Beijing University of Aeronautics and Astronautics, Beijing 100083
2Beijing Laboratory of Electronic Microscopy, Academia Sinica, Beijing 100080
3Department of Electronic Engineering, Beijing Institute of Technology, Beijing 100081
4Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008
Abstract： The hydrogenated nano-crystalline silicon (nc-Si:H) films have deposited with plasma enhanced chemical vapor deposition method. The microstructure of these films has been studied by transmission electron microscopy and high resolution transmission electron microscopy. The nc-Si H films show fiber texture structure. The fractal dimension of this structure has been calculated with a Fourier filtered image. The relationship between conductivity and temperature has also been studied and the mechanism of electron conduction is discussed.
HE Yuliang;CHU Yiming;LIN Hongyi;JIANG Shusheng. Microstructure and Electron Conduction Mechanism of Hydrogenated Nano-crystalline Silicon Films[J]. 中国物理快报, 1993, 10(9): 539-542.
HE Yuliang, CHU Yiming, LIN Hongyi, JIANG Shusheng. Microstructure and Electron Conduction Mechanism of Hydrogenated Nano-crystalline Silicon Films. Chin. Phys. Lett., 1993, 10(9): 539-542.
1993, Vol. 10 
