Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing
JIANG Zhu-Qing, TAO Shi-Quan, YUAN Wei, LIU Guo-Qing, WANG Da-Yong
College of Applied Sciences, Beijing University of Technology, Beijing 100022
Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing
JIANG Zhu-Qing;TAO Shi-Quan;YUAN Wei;LIU Guo-Qing;WANG Da-Yong
College of Applied Sciences, Beijing University of Technology, Beijing 100022
关键词 ：
42.40.Pa ,
42.40.Ht ,
42.20.Lx
Abstract ： The optical erasure dynamics in a batch-thermal fixing scheme of holographic storage in photorefractive crystals is investigated theoretically and experimentally. The inter-batch optical erasure time constant τF is introduced to specify the optical erasure to compensated gratings, and measured in a sophisticated experiment. The experimental result shows that τF is much longer than the intra-batch optical erasure time constant τE . The difference between τF and τE is fundamental for enhancing nonvolatile storage density.
Key words ：
42.40.Pa
42.40.Ht
42.20.Lx
出版日期: 2006-10-01
引用本文:
JIANG Zhu-Qing;TAO Shi-Quan;YUAN Wei;LIU Guo-Qing;WANG Da-Yong. Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing[J]. 中国物理快报, 2006, 23(10): 2749-2752.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2006/V23/I10/2749
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