Photoabsorption Spectra of Nano-Crystalline Silicon Films
LIU Xiangna, HE Yuliang, F. Wang*, R. Schwarz*
Department of Physics, and Laboratory of Solid State Microstructures, Nanjing University, Nanjing 201800
*Department of Physics El6, T. U. Munich, F. R. Germany
Photoabsorption Spectra of Nano-Crystalline Silicon Films
LIU Xiangna;HE Yuliang;F. Wang*;R. Schwarz*
Department of Physics, and Laboratory of Solid State Microstructures, Nanjing University, Nanjing 201800
*Department of Physics El6, T. U. Munich, F. R. Germany
Abstract： The photoabsorption spectra of nano-crystalline silicon (nc-Si :H) films were measured by means of constant photoconductivity method. We investigated the changes of absorption spectra with the increasing of crystallinity as the deposited films are amorphous, microcrystalline and nano-crystalline. We found that in nc-Si : H the transition processes in the interfacial region between the grains predominate the whole range of the absorption spectra. We related the phenomenon to the structural changes in the material.
LIU Xiangna;HE Yuliang;F. Wang*;R. Schwarz*. Photoabsorption Spectra of Nano-Crystalline Silicon Films[J]. 中国物理快报, 1993, 10(12): 752-755.
LIU Xiangna, HE Yuliang, F. Wang*, R. Schwarz*. Photoabsorption Spectra of Nano-Crystalline Silicon Films. Chin. Phys. Lett., 1993, 10(12): 752-755.
1993, Vol. 10 
