Analysis of Step Etching on SrTiO3 Substrates for the
Step-Edge YBCO Josephson Junctions
CHEN Geng-Hua, WANG Jing, ZHAO Shi-Ping, HAN Bing, XU Feng-Zhi, YANG Qian-Sheng
Institute of Physics and Center for Condensed Matter Physics,
Chinese Academy of Sciences, Beijing 100080
Analysis of Step Etching on SrTiO3 Substrates for the
Step-Edge YBCO Josephson Junctions
CHEN Geng-Hua;WANG Jing;ZHAO Shi-Ping;HAN Bing;XU Feng-Zhi;YANG Qian-Sheng
Institute of Physics and Center for Condensed Matter Physics,
Chinese Academy of Sciences, Beijing 100080
关键词 ：
74.50.+r ,
74.76.Bz ,
85.25.Dq
Abstract ： A way to determine some important etching parameters in the step fabrication for highTc step-edge Josephson junctions is described based on an analysis of the dynamics of the etching process. The optimum thickness of the etch mask is defined with negligible recession of the mask edge during the etch. Under this condition, the equilibrium angle of the steps etched on the SrTiO3 (STO) substrate with an Nb mask has been calculated to be about 76°. With optimized mask thickness, its sharp sidewall and straight edge, high-quality steps on STO substrates with step height from 200-300 nm and step angle above 70°are made. Josephson junctions and dc-SQUIDs with high reproducibility and less parameter scatter are obtained on the step substrates.
Key words ：
74.50.+r
74.76.Bz
85.25.Dq
出版日期: 2001-01-01
:
74.50.+r
(Tunneling phenomena; Josephson effects)
74.76.Bz
85.25.Dq
(Superconducting quantum interference devices (SQUIDs))
引用本文:
CHEN Geng-Hua;WANG Jing;ZHAO Shi-Ping;HAN Bing;XU Feng-Zhi;YANG Qian-Sheng
. Analysis of Step Etching on SrTiO3 Substrates for the
Step-Edge YBCO Josephson Junctions
[J]. 中国物理快报, 2001, 18(1): 106-108.
3 Substrates for the
Step-Edge YBCO Josephson Junctions
. Chin. Phys. Lett., 2001, 18(1): 106-108.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2001/V18/I1/106
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