Shadow Effect and Its Revisal in Grid-Enhanced Plasma Source with Ion Implantation Method
ZHANG Gu-Ling1, WANG Jiu-Li1, LIU Yuan-Fu1, LI Xue-Ming2, WU Xing-Fang2, FAN Song-Hua1, LIU Chi-Zi1, YANG Si-Ze1
1Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083
Shadow Effect and Its Revisal in Grid-Enhanced Plasma Source with Ion Implantation Method
1Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083
Abstract： The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surface grid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, we need to use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, we apply an axial magnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that the shadow effect of sample surfaces can be weakened.
ZHANG Gu-Ling;WANG Jiu-Li;LIU Yuan-Fu;LI Xue-Ming;WU Xing-Fang;FAN Song-Hua;LIU Chi-Zi;YANG Si-Ze. Shadow Effect and Its Revisal in Grid-Enhanced Plasma Source with Ion Implantation Method[J]. 中国物理快报, 2004, 21(6): 1114-1116.
ZHANG Gu-Ling, WANG Jiu-Li, LIU Yuan-Fu, LI Xue-Ming, WU Xing-Fang, FAN Song-Hua, LIU Chi-Zi, YANG Si-Ze. Shadow Effect and Its Revisal in Grid-Enhanced Plasma Source with Ion Implantation Method. Chin. Phys. Lett., 2004, 21(6): 1114-1116.
2004, Vol. 21 
