Dust Charging in Electronegative SiH4 Plasmas
DUAN Ping1,2 , WANG Zheng-Xiong2 , LIU Yue2 , LIU Jin-Yuan2 , WANG Xiao-Gang2
1 Department of Physics, Dalian University, Dalian 116622
2 State Key Laboratory of Materials Modification by Laser, Electron and Ion Beams, Dalian University of Technology, Dalian 116024
Dust Charging in Electronegative SiH4 Plasmas
DUAN Ping1,2 ;WANG Zheng-Xiong2 ;LIU Yue2 ;LIU Jin-Yuan2 ;WANG Xiao-Gang2
1 Department of Physics, Dalian University, Dalian 116622
2 State Key Laboratory of Materials Modification by Laser, Electron and Ion Beams, Dalian University of Technology, Dalian 116024
关键词 ：
52.27.Lw ,
52.80.Tn
Abstract ： We theoretically investigate the dust charging in electronegative silane (SiH4 ) plasmas, taking into account the effects of UV photodetachment. It is found that UV photodetachment could significantly lower the dust negative charge and even makes dust grains be positively charged under some special conditions. In addition, the other parameters, involving the negative ion and dust number densities, electron temperature and dust radius, have great effects upon the dust charging.
Key words ：
52.27.Lw
52.80.Tn
出版日期: 2005-02-01
:
52.27.Lw
(Dusty or complex plasmas; plasma crystals)
52.80.Tn
(Other gas discharges)
引用本文:
DUAN Ping;WANG Zheng-Xiong;LIU Yue;LIU Jin-Yuan;WANG Xiao-Gang. Dust Charging in Electronegative SiH4 Plasmas[J]. 中国物理快报, 2005, 22(2): 405-408.
4 Plasmas. Chin. Phys. Lett., 2005, 22(2): 405-408.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2005/V22/I2/405
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2005, Vol. 22 
