中国物理快报  2005, Vol. 22 Issue (1): 76-79    
  Original Articles 本期目录 | 过刊浏览 | 高级检索 |
Molecular Dynamics Simulation of Ion Implantation into HfO2 and HfOx/Si Multi-Layer Structure
SHI Hao1, YU Min1, HUANG Ru1, WANG Yang-Yuan1, SUZUKI Kunihiro1, OKA Hideki2
1Institute of Microelectronics, Peking University, Beijing 100871 2Fujitsu Laboratories LTD, 10-1 Morinosato-Wakamiya, Atsugi 243-0197, Japan
Molecular Dynamics Simulation of Ion Implantation into HfO2 and HfOx/Si Multi-Layer Structure
SHI Hao1;YU Min1;HUANG Ru1;WANG Yang-Yuan1;SUZUKI Kunihiro1;OKA Hideki2
1Institute of Microelectronics, Peking University, Beijing 100871 2Fujitsu Laboratories LTD, 10-1 Morinosato-Wakamiya, Atsugi 243-0197, Japan