Dielectric Characterization of Free-Standing Diamond Films
ZHANG Heng-Da, CHEN Guang-Chao, LI Cheng-Ming, TANG Wei-Zhong, LÜ Fan-Xiu
School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083
Dielectric Characterization of Free-Standing Diamond Films
ZHANG Heng-Da;CHEN Guang-Chao; LI Cheng-Ming;TANG Wei-Zhong; LÜ Fan-Xiu
School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083
关键词 ：
77.22.Jp ,
77.55.Tf ,
81.15.Gh
Abstract ： The dielectric properties of free-standing diamond films grown by the dc arc-jet plasma method are measured by an impedance analyser in the temperature range of 298-573 K and at frequencies between 1000 Hz and 1 MHz. In the temperature and frequency ranges, the loss tangent can be expressed as a function of temperature and frequency. The loss tangent increases slightly with increasing temperature and frequency. The dielectric properties of the diamond films decrease with the increasing deposited temperature. The structure and quality of diamond films have been analysed by scanning electron microscopy, x-ray diffraction and Raman spectroscopy.
Key words ：
77.22.Jp
77.55.Tf
81.15.Gh
出版日期: 2002-11-01
:
77.22.Jp
(Dielectric breakdown and space-charge effects)
77.55.Tf
81.15.Gh
(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
引用本文:
ZHANG Heng-Da;CHEN Guang-Chao; LI Cheng-Ming;TANG Wei-Zhong; LÜFan-Xiu. Dielectric Characterization of Free-Standing Diamond Films[J]. 中国物理快报, 2002, 19(11): 1695-1696.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2002/V19/I11/1695
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