Structural and Optical Characterization of Zn1-xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering
MA De-Wei1, YE Zhi-Zhen1, HUANG Jing-Yun1, ZHAO Bing-Hui1, WAN Shou-Ke2, SUN Xue-Hao2, WANG Zhan-Guo2
1State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027
2Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
Structural and Optical Characterization of Zn1-xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering
MA De-Wei1;YE Zhi-Zhen1;HUANG Jing-Yun1;ZHAO Bing-Hui1;WAN Shou-Ke2;SUN Xue-Hao2;WANG Zhan-Guo2
1State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027
2Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
Abstract： Zn1-xCdxO crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. X-ray diffraction measurements show that the Zn1-xCdxO films are of completely (002)-preferred orientation for x ≤ 0.6. For x = 0.8, the film is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-xCdxO (x = 0.2) thin film has a red-shift of 0.14 eV from that of ZnO reported previously.
MA De-Wei;YE Zhi-Zhen;HUANG Jing-Yun;ZHAO Bing-Hui;WAN Shou-Ke;SUN Xue-Hao;WANG Zhan-Guo. Structural and Optical Characterization of Zn1-xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering[J]. 中国物理快报, 2003, 20(6): 942-943.
MA De-Wei, YE Zhi-Zhen, HUANG Jing-Yun, ZHAO Bing-Hui, WAN Shou-Ke, SUN Xue-Hao, WANG Zhan-Guo. Structural and Optical Characterization of Zn1-xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering. Chin. Phys. Lett., 2003, 20(6): 942-943.
2003, Vol. 20 
