Spectral Properties of Erbium-Doped Oxyfluoride Silicate Glasses for Broadband Optical Amplifiers
XU Shi-Qing, YANG Zhong-Min, DAI Shi-Xun, YANG Jian-Hu, WEN Lei, HU Li-Li, JIANG Zhong-Hong
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
Spectral Properties of Erbium-Doped Oxyfluoride Silicate Glasses for Broadband Optical Amplifiers
XU Shi-Qing;YANG Zhong-Min;DAI Shi-Xun;YANG Jian-Hu;WEN Lei;HU Li-Li;JIANG Zhong-Hong
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
关键词 ：
73.43.Fj ,
74.25.Gz ,
73.61.Jc ,
76.30.Kg
Abstract ： The new oxyfluoride silicate glasses of Er3+ -doped 50SiO2 -(50-x)PbO-xPbF2 were prepared. With increasing PbF2 content in the glass composition, the fluorescence full width at half max maximum and lifetimes of the 4 I13/2 level of Er3+ increase, while the refractive indices and densities decrease. Er3+ -doped 50SiO2 -50PbF2 glass showed broad fluorescence spectra of 1.55μm with a large stimulated emission cross-section and long lifetimes of 4 I13/2 level of Er3+ . Compared with other glass hosts, the gain bandwidth properties of Er3+ -doped 50SiO2 -50PbF2 glass are close to those of tellurite and bismuth glasses, and have advantages over those of silicate, phosphate and germante glasses. The broad and flat 4 I13/2 → 4 I15/2 emission of Er3+ around 1.55μm can be used as host material for potential broadband optical amplifier in wavelength-division-multiplexing network system.
Key words ：
73.43.Fj
74.25.Gz
73.61.Jc
76.30.Kg
出版日期: 2003-06-01
:
73.43.Fj
(Novel experimental methods; measurements)
74.25.Gz
(Optical properties)
73.61.Jc
(Amorphous semiconductors; glasses)
76.30.Kg
(Rare-earth ions and impurities)
引用本文:
XU Shi-Qing;YANG Zhong-Min;DAI Shi-Xun;YANG Jian-Hu;WEN Lei;HU Li-Li;JIANG Zhong-Hong. Spectral Properties of Erbium-Doped Oxyfluoride Silicate Glasses for Broadband Optical Amplifiers[J]. 中国物理快报, 2003, 20(6): 905-908.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2003/V20/I6/905
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2003, Vol. 20 
