Dynamic Scaling in Growth of ZrO2 Thin Films Prepared by Electronic Beam Evaporation
QI Hong-Ji1 , HUANG Li-Hua2 , YUAN Jing-Mei1 , CHENG Chuan-Fu1 , SHAO Jian-Da1 , FAN Zheng-Xiu1
1 Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
2 Laser Technology and Engineering Research Institute, Huazhong University of Science and Technology, Wuhan 430074
Dynamic Scaling in Growth of ZrO2 Thin Films Prepared by Electronic Beam Evaporation
QI Hong-Ji1 ;HUANG Li-Hua2 ;YUAN Jing-Mei1 ;CHENG Chuan-Fu1 ;SHAO Jian-Da1 ;FAN Zheng-Xiu1
1 Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
2 Laser Technology and Engineering Research Institute, Huazhong University of Science and Technology, Wuhan 430074
关键词 ：
68.55.Jk ,
77.55.+f ,
81.15.Ef ,
68.37.Ps
Abstract ： The growth front evolution of ZrO2 thin films deposited by electronic beam evaporation has been studied with atomic force microscopy. The dynamic scaling characteristics are observed during the deposition process. After numerical correlation analysis, the roughness exponent α = 0.80±0.005 and the growth exponent β = 0.141 are all obtained. Based on these results, we suggest that the growth of ZrO2 thin films can be described by the combination of the Edwards-Wilkinson equation, the Mullins diffusion equation and the shadowing effect.
Key words ：
68.55.Jk
77.55.+f
81.15.Ef
68.37.Ps
出版日期: 2003-05-01
引用本文:
QI Hong-Ji;HUANG Li-Hua;YUAN Jing-Mei;CHENG Chuan-Fu;SHAO Jian-Da;FAN Zheng-Xiu. Dynamic Scaling in Growth of ZrO2 Thin Films Prepared by Electronic Beam Evaporation[J]. 中国物理快报, 2003, 20(5): 709-712.
2 Thin Films Prepared by Electronic Beam Evaporation. Chin. Phys. Lett., 2003, 20(5): 709-712.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2003/V20/I5/709
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2003, Vol. 20 
