Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition
LIN Ying-Bin1,2, YANG Yan-Min2, XU Jian-Ping1, LIU Xing-Chong1, WANG Jian-Feng1, HUANG Zhi-Gao2, ZHANG Feng-Ming1, DU You-Wei1
2National Laboratory of Solid State Microstructures, Jiangsu Provincial Laboratory for Nanotechnology, Department of Physics, Nanjing University, Nanjing 2100931Department of Physics, Fujian Normal University, Fuzhou 350007
Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition
LIN Ying-Bin1,2;YANG Yan-Min2;XU Jian-Ping1;LIU Xing-Chong1;WANG Jian-Feng1;HUANG Zhi-Gao2;ZHANG Feng-Ming1;DU You-Wei1
2National Laboratory of Solid State Microstructures, Jiangsu Provincial Laboratory for Nanotechnology, Department of Physics, Nanjing University, Nanjing 2100931Department of Physics, Fujian Normal University, Fuzhou 350007
摘要ZnO and Mn-doped ZnO polycrystalline films are prepared by plasma enhanced chemical vapour deposition at low temperature (220°C), and room-temperature photoluminescence of the films is systematically investigated. Analysis from x-ray diffraction reveals that all the prepared films exhibit the wurtzite structure of ZnO, and Mn-doping does not induce the second phase in the films. X-ray photoelectron spectroscopy confirms the existence of Mn2+ ions in the films rather than metallic Mn or Mn4+ ions. The emission efficiency of the ZnO film is found to be dependent strongly on the post-treatment and to degrade with increasing temperature either in air or in nitrogen ambient. However, the enhancement of near band edge (NBE) emission is observed after hydrogenation in ammonia plasma, companied with more defect-related emission. Furthermore, the position of NBE shifts towards to high-energy legion with increasing Mn-doped concentration due to Mn incorporation into ZnO lattice.
Abstract:ZnO and Mn-doped ZnO polycrystalline films are prepared by plasma enhanced chemical vapour deposition at low temperature (220°C), and room-temperature photoluminescence of the films is systematically investigated. Analysis from x-ray diffraction reveals that all the prepared films exhibit the wurtzite structure of ZnO, and Mn-doping does not induce the second phase in the films. X-ray photoelectron spectroscopy confirms the existence of Mn2+ ions in the films rather than metallic Mn or Mn4+ ions. The emission efficiency of the ZnO film is found to be dependent strongly on the post-treatment and to degrade with increasing temperature either in air or in nitrogen ambient. However, the enhancement of near band edge (NBE) emission is observed after hydrogenation in ammonia plasma, companied with more defect-related emission. Furthermore, the position of NBE shifts towards to high-energy legion with increasing Mn-doped concentration due to Mn incorporation into ZnO lattice.
LIN Ying-Bin;YANG Yan-Min;XU Jian-Ping;LIU Xing-Chong;WANGJian-Feng;HUANG Zhi-Gao;ZHANG Feng-Ming;DU You-Wei. Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition[J]. 中国物理快报, 2007, 24(9): 2685-2688.
LIN Ying-Bin, YANG Yan-Min, XU Jian-Ping, LIU Xing-Chong, WANGJian-Feng, HUANG Zhi-Gao, ZHANG Feng-Ming, DU You-Wei. Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition. Chin. Phys. Lett., 2007, 24(9): 2685-2688.
[1] Pearton J, Norton D P, Heo Y W and Steiner T 2004 J. Vac. Sci.Technol. B 22 932 [2] Gupa V and Mansingh A 1996 J. Appl. Phys. 80 1063 [3] Jiang X, Wong F L, Fung M K and Lee S T 2003 Appl. Phys.Lett. 83 1875 [4] H C W, Ji Z G, Liu K, Xiang Y and Ye Z Z 2003 J. Cryst.Growth 259 279 [5] Lin Y J, Tsai C L, Lu Y M and Liu C J 2006 J. Appl. Phys. 99 093501 [6] Wei X Q, Man B Y, Xue C S, Chen C S and Liu M 2006 Jpn. J.Appl. Phys. 45 8586 [7] Srinivasan G.and Kumar J 2006 Cryst. Res. Technol. 41893 [8] Purica M, Budianu E, Rusu E, Danila M and Gavrila R 2002 ThinSolid Films 403-404 485 [9] Lin Y B, Xu J P, Zou W Q, Lv L Y, Lu Z H, Zhang F M, Du Y W, HuangZ G and Zheng J G 2007 J. Phys. D: Appl. Phys. 40 3674 [10] Huang M H, Wu Y Y, Feick H, Tran N, Weber E and Yang P 2001 Adv. Mater. 13 113 [11] Bagnall D M, Chen Y F, Zhu Z, Yao T, Shen M Y and Goto T 1998 Appl. Phys. Lett. 75 1038 [12] Reynolds D C, Look D C and Jogai B 2001 J. Appl. Phys. 89 6189 [13] Wang Y G, Lau S P, Zhang X H, Hong H H, Lee H W and Yu S F, Tay BK 2003 J. Cryst. Growth. 259 335 [14] Zhang Y, Du G, Liu D, Wang X, Ma Y, Wang J, Yin J, Yang X, Hou Xand Yang S 2002 J. Cryst. Growth. 243 430 [15] Ma Y J, Zhang Z, Zhou F, Lu L, Jin A Z and Gu C Z 2005 Nanotechnology 16 746 [16] Wang J B, Zhong H M, Li Z F and Lu W 2006 Appl. Phys. Lett. 88 1019163 [17] Cong C J, Liao L, Li J C, Fan L X and Zhang K L 2005 Nanotechnology 16 981 [18] Xu H Y, Liu Y C, Xu C S, Liu Y X, Shao C L and Mu R 2006 Appl. Phys. Lett. 88 242502 [19] Macdonald A H, Schiffer P and Samarth N 2005 Nat. Mater. 4 195 [20] Nazmul A M, Sugahara S and Tanaka M 2003 Phys. Rev. B 67 241308 [21] Shan F K, Kim B I, Liu G X, Liu Z F, Sohn J Y, Lee W J, Shin B Cand Yu Y S 2004 J. Appl. Phys. 95 4772 [22] Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T and Nakabayashi I1997 J. Vac. Sci. Technol. A 15 1074 [23] Jung S W, An S J and Yi G C 2002 Appl. Phys. Lett. 804561