Analysis and Determination of Refractive Index Profiles of O2+ Ion-Implanted LiNbO3 Planar Waveguide Using Etching and Ellipsometry Techniques
LIU Han-Ping, LU Fei1, WANG Xue-Lin2, YANG Tian-Lin3, LV Ying-Bo3, LI Yan-Hui3, LIU Xiang-Zhi1, ZHANG Rui-Feng1, SONG Qiang1, MA Xue-Jian2
1School of Information Science and Engineering, Shandong University, Jinan 2501002School of Physics and Microelectronics, Shandong University, Jinan 2501003Department of Space Science and Applied Physics, ShandongUniversity, Weihai 264209
Analysis and Determination of Refractive Index Profiles of O2+ Ion-Implanted LiNbO3 Planar Waveguide Using Etching and Ellipsometry Techniques
1School of Information Science and Engineering, Shandong University, Jinan 2501002School of Physics and Microelectronics, Shandong University, Jinan 2501003Department of Space Science and Applied Physics, ShandongUniversity, Weihai 264209
摘要The refractive index profiles of 3MeV O2+ ion-implanted planar waveguides in lithium niobate are reconstructed based on etching and ellipsometry techniques. SRIM2003 code is used to simulate the damage distribution in waveguide. It is demonstrated that the index profile of this kind of waveguide, extending to several micrometres in depth, can be determined by etching in combination with following ellipsometric measurements. A good agreement is found between the simulated damage distributions in waveguide and the index profiles based on experimental data, and the width of refractive index barrier is wider than the result of SRIM2003.
Abstract：The refractive index profiles of 3MeV O2+ ion-implanted planar waveguides in lithium niobate are reconstructed based on etching and ellipsometry techniques. SRIM2003 code is used to simulate the damage distribution in waveguide. It is demonstrated that the index profile of this kind of waveguide, extending to several micrometres in depth, can be determined by etching in combination with following ellipsometric measurements. A good agreement is found between the simulated damage distributions in waveguide and the index profiles based on experimental data, and the width of refractive index barrier is wider than the result of SRIM2003.
LIU Han-Ping;LU Fei;WANG Xue-Lin;YANG Tian-Lin;LV Ying-Bo;LI Yan-Hui;LIU Xiang-Zhi;ZHANG Rui-Feng;SONG Qiang;MA Xue-Jian. Analysis and Determination of Refractive Index Profiles of O2+ Ion-Implanted LiNbO3 Planar Waveguide Using Etching and Ellipsometry Techniques[J]. 中国物理快报, 2008, 25(1): 156-159.
LIU Han-Ping, LU Fei, WANG Xue-Lin, YANG Tian-Lin, LV Ying-Bo, LI Yan-Hui, LIU Xiang-Zhi, ZHANG Rui-Feng, SONG Qiang, MA Xue-Jian. Analysis and Determination of Refractive Index Profiles of O2+ Ion-Implanted LiNbO3 Planar Waveguide Using Etching and Ellipsometry Techniques. Chin. Phys. Lett., 2008, 25(1): 156-159.
[1] Townsend P D et al 1994 Optical Effects of Ion Implantation(Cambridge: Cambridge University) [2] Lu F et al 2005 Opt. Express 13 9143 [3] Pogossian S P and Gall H L 2003 J. Appl. Phys. 93 2337 [4] Rams J et al 2000 J. Appl. Phys. 87 3199 [5] White J M and Heidrich P F 1976 Appl. Opt. 15 151 [6] Chandler P J and Lama F L 1986 Opt. Act. 33 127 [7] Fluck D et al 1993 J. Appl. Phys. 74 6023 [8] Feit M D and Fleck J A 1978 Appl. Opt. 17 3990 [9] LIU X Z et al 2007 Opt. Commun. 274 80 [10] Tonova D and Konova A 1996 Surf. Sci. 349 221 [11] Tonova D et al 1998 Opt. Commun. 150 121 [12] Hu H et al 2007 IEEE Photon. Technol. Lett. 19 417 [13] Azzam R M A and Bashara N M 1996 Ellipsometry and PolarizedLight translated by Liang M J et al (Beijing: Science Press) (inChinese) [14] Born M and Wolf E 1981 Principles of Optics translated byHuang L T (Beijing: Science Press) (in Chinese) [15] Hu H et al 2000 Opt. Commun. 177 189
2008, Vol. 25 
