Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
HUNDUR Yakup1, GUVENC Ziya B2, HIPPLER Rainer3
1Department of Physics, Istanbul Technical University, Istanbul, TR-34469, Turkey2Electronic and Communication Engineering, Cankaya University, Balgat, Ankara, TR-06530, Turkey 3Institut fur Physik, Ernst-Moritz-Arndt Universitate Greifswald, Greifswald, D-17489, Germany
Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System
HUNDUR Yakup1;GUVENC Ziya B2;HIPPLER Rainer3
1Department of Physics, Istanbul Technical University, Istanbul, TR-34469, Turkey2Electronic and Communication Engineering, Cankaya University, Balgat, Ankara, TR-06530, Turkey 3Institut fur Physik, Ernst-Moritz-Arndt Universitate Greifswald, Greifswald, D-17489, Germany
The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20--50eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical andexperimental data.
Abstract：The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20--50eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical andexperimental data.
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2008, Vol. 25 
