Concentration Profiling of Fluorine in F-doped SnO2 Film
XU Bingzhang, XIA Yueyuan, TAN Chunyu, CHEN Youpeng, LI Shuying, ZHENG Zongshuang*, JIANG Weilin*
Department of Physics, Shandong University, Jinan 250100
*Institute of Physics, Academia Sinica, Beijing 100080
Concentration Profiling of Fluorine in F-doped SnO2 Film
XU Bingzhang;XIA Yueyuan;TAN Chunyu;CHEN Youpeng;LI Shuying;ZHENG Zongshuang*;JIANG Weilin*
Department of Physics, Shandong University, Jinan 250100
*Institute of Physics, Academia Sinica, Beijing 100080
关键词 ：
61.80.Jh ,
61.70.Wp
Abstract ： Depth profiles of fluorine in F-doped tin oxide (FTO) films prepared by atmospherical pressure chemical vapour deposition method have been studied by use of 19 F(p,αγ ) 16 O resonance nuclear reactions near 872.1 keV. A proper convolution method was used to get the real depth profiles of fluorine from the measured γ-ray excitation curves. Secondary ion mass spectrometry in conjunction with Rutherford backscattering spectrometry analysis was used to determine the density of the FTO films. It was found that the density of the films is markedly different from an earlier reported value.
Key words ：
61.80.Jh
61.70.Wp
出版日期: 1992-07-01
引用本文:
XU Bingzhang;XIA Yueyuan;TAN Chunyu;CHEN Youpeng;LI Shuying;ZHENG Zongshuang*;JIANG Weilin*. Concentration Profiling of Fluorine in F-doped SnO2 Film[J]. 中国物理快报, 1992, 9(7): 371-374.
2 Film. Chin. Phys. Lett., 1992, 9(7): 371-374.
链接本文:
https://cpl.iphy.ac.cn/CN/
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https://cpl.iphy.ac.cn/CN/Y1992/V9/I7/371
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1992, Vol. 9 
