Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System
PENG Gongwen*, TIAN Decheng
*Institute of Physics, Academia Sinica, Beijing 100080
Department of Physics, Wuhan University, Wuhan 430072,
And International Center for Materials Physics, Academia Sinica, Shenyang 110015
Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System
PENG Gongwen*;TIAN Decheng
*Institute of Physics, Academia Sinica, Beijing 100080
Department of Physics, Wuhan University, Wuhan 430072,
And International Center for Materials Physics, Academia Sinica, Shenyang 110015
Abstract： We extend the diffusion-limited aggregation model of Witten and Sander to the electrochemical deposition system by considering the effects of the external electric field. A jump probability for field-biased-diffusion is reasonably deduced, which enables us to obtain a series of loopless random fractals with varying fractal dimensions.
1992, Vol. 9 
